Chemical Vapor Deposition

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Description

This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD).

Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject.

The volume emphasizes principles and understanding rather than details of specific materials or processes.

Specific examples are given to illustrate the principles.

Details

ISBN: 9780123496706
Authors: M. L. Hitchman, K. F. Jensen
Language: Rom?n?
Publication Year: 1993
Format: Hardcover
Publisher: Elsevier Science
Pages: 677
Weight: 1150gr

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Chemical Vapor Deposition

1,440.34 LEI

1,600.38 LEI

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