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Coperta cărții "Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications" de autor necunoscut

Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications

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Description

This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume.

The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up.

Materials deposition chemistry, equipment, process technology, developments, and applications are described.

Details
  • ISBN: 9780815512882
  • Authors: John E.J. Schmitz
  • Language: Rom?n?
  • Publication Year: 1992
  • Format: Hardcover
  • Publisher: Elsevier Science
  • Pages: 251
  • Weight: 470gr
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